Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.
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Suitable for making heating element for electrical oven and magnetron.
适用于制作电气炉发热元件等.
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The kinetic process of reactive magnetron sputtering has been studied.
研究了反应磁控溅射的动力学过程.
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Magnetron is often used as microwave power source in clinical linac magnetron.
在医用直线加速器中通常都采用磁控管作为微波功率源.
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Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .
采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.
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The generator represents magnetron, packaged with constant magnets in ceramic - metal execution.
该磁控管采用金属陶瓷封装,装有永磁体.
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The generator represents magnetron , packaged with constants and electromagnets ( 2 coils magnetic ) in the magnetic - shielded ceramic - metal execution.
该磁控管的设计采用电磁石,封装采用金属陶瓷.
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Si rich SiO 2 films have been prepared by a rf magnetron sputter method.
用射频磁控溅射法制备了富硅二氧化硅薄膜.
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Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜.
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Methods: The nature HA films were prepared by electron beam evaporation and rf - magnetron sputtering techniques.
方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.
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The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.
利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.
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Its principle and some other aredescribed, including the magnetron sputter coater and the osmium plasma coater.
本文将主要叙述等离子溅射镀膜的原理与方法,并且简单介绍磁控管溅射仪和锇等离子镀膜仪等.
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Ti - O film was prepared by microwave - electron convolute resonance ( MW - ECR ) magnetron filter arc deposition process.
采用微波电子回旋 共振 磁过滤弧设备制备钛氧薄膜.
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In the fourth chapter Sb - doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.
第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.
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Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.
采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.
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